TITLE:PHOENICS-CVD Example 2
BY: J R Heritage, CHAM Consultancy
DATE: 1996 PHOENICS Version: 2.2
PURPOSE OF CALCULATIONS:
To demonstrate the use of the CVD option in PHOENICS.
FLOW AND COMPUTATIONAL DETAILS
This is a showerhead reactor for tungsten deposition; the reactants are tungsten hexafluoride and hydrogen, with hydrofluoric acid as the product.
For this process the gas-phase chemistry is relatively unimportant and a single surface reaction is used.
The geometry and velocity vectors are shown below.
The geometry and flow field.
The inlet block is heated by radiation from the susceptor; it loses heat by radiation to the cooled outer walls and directly to the gas
H2 is used up in the surface reaction but its mass fraction slightly increases as tungsten deposition reduces the mixture molecular mass
H2 mass fraction
HF is created only at the susceptor surface and spreads throughout the reactor by convection and diffusion
HF mass fraction