TITLE:PHOENICS-CVD Example 3
BY: J R Heritage, CHAM Consultancy
DATE: 1996 PHOENICS Version: 2.2
PURPOSE OF CALCULATIONS:
To demonstrate the use of the CVD option in PHOENICS.
FLOW AND COMPUTATIONAL DETAILS
This is a plasma-enhanced parallel plate reactor for silicon deposition from silane. Three gas-phase and two surface reactions are used; all are plasma-enhanced.
The geometry, velocity vectors and contours of temperature are shown below.
The geometry and flow field.
SiH4 mass fraction and H2 mass fraction
Electron temperature and electron density