Chemical Vapor Deposition Simulation Software
For Equipment Design and Process
OF A SILICON WAFER BATCH IN A PRE-HEATED FURNACE
Why simulate CVD?
Simulation is used to improve the design of CVD equipment, to reduce the need for
prototyping and to answer the "what if" questions of engineers. Using the
PHOENICS-CVD software system engineers can:-
- optimize CVD reactor design;
- tune process parameters to improve yield;
- explore new processes before equipment is purchased;
- troubleshoot poorly operating processes and equipment.
PHOENICS-CVD is an integrated software system designed to simulate the behavior of a wide
range of CVD reactors; this involves the modeling of fluid flow and heat transfer in a
multi-component gas, including both gas-phase (homogeneous) and surface (heterogeneous)
chemical reactions and incorporating plasma effects. Implementation is by means of a
graphical, menu-driven, object-orientated interface, coupled with a library of generic
reactor designs providing an easy route to problem set-up and modification. PHOENICS-CVD
- Simulation of steady-state or transient (process start-up and shut-down) behavior in
Cartesian, polar or BFC grids;
- Multi-component diffusion and gas properties with a choice of models;
- Thermal diffusion with a choice of options;
- Gas and surface chemical reactions, with built-in options and the provision for
user-coding if required;
- Surface-to-surface radiation;
- Plasma modelling using an effective drift-diffusion model;
- Data files for transport, thermodynamic, material, optical and chemical reaction
- Platform independence: ability to run on PCs (MS Windows/LINUX), workstations (UNIX and
VAX) and supercomputers.
Application examplesTungsten deposition in a single wafer, cold-wall reactor;
Polysilicon growth in an RTP reactor;
Plasma-enhanced deposition of amorphous silicon;
Polysilicon single wafer reactor processes;
Metalorganic deposition of titanium nitride;
SiO2 deposition in a commercial reactor.
PHOENICS-CVD has been used to simulate:- Silicon nitride formation in a hot wall batch reactor;
PHOENICS-CVD has been validated for a range of CVD processes. The development and
experimental verification of PHOENICS-CVD are documented in over 20 publications; copies
are available from CHAM.
For further information about
PHOENICS-CVD, licence arrangements, consultancy, seminars and courses, and more
specifically what it can do for you, contact CHAM.
Concentration, Heat & Momentum Ltd
Bakery House, 40 High Street
Wimbledon Village, London SW19 5AU
Tel: +44 208 947 7651
Fax: +44 208 879 3497
© Copyright 1999 CHAM Ltd.